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Backscattering analysis of AuGe‐Ni ohmic contacts ofn‐GaAs

 

作者: D. D. Cohen,   T. S. Kalkur,   G. J. Sutherland,   A. G. Nassibian,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 9  

页码: 3100-3104

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337767

 

出版商: AIP

 

数据来源: AIP

 

摘要:

AuGe‐Ni is widely used for the fabrication of ohmic contacts ton‐GaAs. The alloying behavior of evaporated AuGe‐Ni alloyed by furnace and scanning electron beam (SEB) is characterized by Rutherford backscattering with 2‐MeV4He+ions. The redistribution and diffusion of constitutents involved in the ohmic contact formation is studied by comparing the experimental spectrum with theoretically computed spectra. The studies show that SEB‐alloyed contacts undergo less redistribution of contact constituents compared with furnace‐alloyed contacts. It is established that the penetration depth of Au for furnace‐alloyed contacts increases with metallization thickness, whereas for SEB‐alloyed contacts the penetration depth is independent of metallization thickness.

 

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