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Characterization of interfacial structure of InGaAs/InP short‐period superlattices by high resolution x‐ray diffraction and Raman scattering

 

作者: Teruo Mozume,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 4  

页码: 1492-1497

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.358899

 

出版商: AIP

 

数据来源: AIP

 

摘要:

InGaAs/InP short‐period superlattices (SPSLs) grown by gas source molecular beam epitaxy (GSMBE) and by gas source migration enhanced epitaxy (GSMEE) on (001)InP substrates were investigated by x‐ray diffraction (XRD) and Raman scattering. XRD and Raman scattering results show that, although the average lattice mismatch relative to the InP substrate in GSMBE‐grown SPSL is close to zero, there may be some lattice parameter relaxation and substrate‐layer tilting caused by asymmetrical ordering of atomic layers and/or interchange between As and P atoms at interfaces. In GSMEE‐grown SPSLs, layer‐by‐layer growth is achieved and strained interface layers are formed. ©1995 American Institute of Physics.

 

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