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Mapping of subsurface inhomogeneities in semiconductors using differential reflectance microscopy

 

作者: J. Tann,   M. Gal,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 1  

页码: 118-120

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115502

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have developed a sensitive optical technique that allows two‐dimensional mapping of subsurface inhomogeneities of semiconductors. Using this contactless, room temperature technique, which is based on differential reflectance spectroscopy, we have been able to generate relief maps which show the spatial distribution of damage/defects in a number of III–V compounds and Si. ©1995 American Institute of Physics.

 

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