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Plasma assisted chemical vapor deposited thin films for microelectronic applications

 

作者: S. V. Nguyen,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1986）
卷期: Volume 4, issue 5  

页码: 1159-1167

 

ISSN:0734-211X

 

年代: 1986

 

DOI:10.1116/1.583476

 

出版商: American Vacuum Society

 

关键词: CHEMICAL VAPOR DEPOSITION;THIN FILMS;FILM GROWTH;INTEGRATED CIRCUITS;MICROELECTRONICS;FABRICATION;REVIEWS;Si3N4

 

数据来源: AIP

 

摘要:

This paper reviews some aspects of and recent advances in plasma assisted deposition of thin films for microelectronic applications. The plasma deposition process and some properties of deposited films relative to integrated circuit fabrication will be briefly discussed. Possible trends in future research and development of plasma deposition for microelectronic applications will also be presented.

 

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