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On‐line determination of alloy composition during ternary III/V molecular beam epitaxy

 

作者: J. Y. Tsao,   T. M. Brennan,   J. F. Klem,   B. E. Hammons,  

 

期刊: Applied Physics Letters  （AIP Available online 1989）
卷期: Volume 55, issue 8  

页码: 777-779

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.101804

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We describe a simple, new method for deducing surface alloy composition during ternary III/V molecular beam epitaxy. The method is based on on‐line reflection mass spectrometry of the group V flux ‘‘reflected’’ from the surface during momentary terminations of individual group III fluxes.

 

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