首页   按字顺浏览 期刊浏览 卷期浏览 Photoreflectance of Cu‐based I–III–VI2heteroepitaxial layers grown b...
Photoreflectance of Cu‐based I–III–VI2heteroepitaxial layers grown by metalorganic chemical vapor deposition

 

作者: Sho Shirakata,   Shigefusa Chichibu,  

 

期刊: Journal of Applied Physics  (AIP Available online 1996)
卷期: Volume 79, issue 4  

页码: 2043-2054

 

ISSN:0021-8979

 

年代: 1996

 

DOI:10.1063/1.361059

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Photoreflectance (PR) spectroscopy has been developed as a powerful technique for the characterization of the heteroepitaxial layer of the Cu–III–VI2semiconductors having the chalcopyrite structure. PR measurements have been carried out in the energy region near the fundamental absorption edge at 77 K for the heteroepitaxial layers of CuAlSe2, CuGaSe2, CuGaS2, and CuAlS2grown on GaAs and GaP substrates by means of the low‐pressure metalorganic chemical vapor deposition. Crystal quality, stress, and the crystallographic orientation have been well characterized, based on the analysis of the PR spectra in terms of transition energy, intensity, and broadening parameter. ©1996 American Institute of Physics.

 

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