Growth of InGaAs/InAlAs quantum wells on InP patterned substrates by molecular beam epitaxy
作者:
F. S. Turco,
M. C. Tamargo,
D. M. Hwang,
R. E. Nahory,
J. Werner,
K. Kash,
E. Kapon,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 1
页码: 72-74
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102655
出版商: AIP
数据来源: AIP
摘要:
We have grown InGaAs/InAlAs quantum wells and InGaAs, InAlAs single layers over InP nonplanar substrates. Photoluminescence, transmission electron microscopy, and energy‐dispersive x‐ray analysis give evidence for large lateral thickness and compositional variations, which lead toinsitumodification of the growth profile. These effects, which differ for InGaAs and InAlAs, reveal the importance of surface migration in (Al,Ga)InAs. Our results demonstrate a tool forinsitulateral patterning of this material system.
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