首页   按字顺浏览 期刊浏览 卷期浏览 Growth of InGaAs/InAlAs quantum wells on InP patterned substrates by molecular beam epi...
Growth of InGaAs/InAlAs quantum wells on InP patterned substrates by molecular beam epitaxy

 

作者: F. S. Turco,   M. C. Tamargo,   D. M. Hwang,   R. E. Nahory,   J. Werner,   K. Kash,   E. Kapon,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 56, issue 1  

页码: 72-74

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.102655

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have grown InGaAs/InAlAs quantum wells and InGaAs, InAlAs single layers over InP nonplanar substrates. Photoluminescence, transmission electron microscopy, and energy‐dispersive x‐ray analysis give evidence for large lateral thickness and compositional variations, which lead toinsitumodification of the growth profile. These effects, which differ for InGaAs and InAlAs, reveal the importance of surface migration in (Al,Ga)InAs. Our results demonstrate a tool forinsitulateral patterning of this material system.

 

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