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rf study of the cathode sheath in a Penning discharge

 

作者: K. Guharay,   J. Basu,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 8  

页码: 4102-4105

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.328219

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The cathode sheath in a cold‐cathode Penning discharge operating in the high‐pressure mode has been investigated by using an rf impedance method. The effect of the presheath lying between the sheath and the plasma has been taken into consideration in deriving the sheath parameters from the impedance of the discharge, measured at two frequencies, under various discharge conditions. The sheath thickness and the dc incremental resistance of the sheath are found to decrease with the discharge current (the static magnetic field being held fixed), while these parameters decrease first, and then remain almost unchanged, if the magnetic field is increased (the discharge current being kept constant).

 

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