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cw laser processing of semiconductor surfaces

 

作者: J. M. Moison,   C. Licoppe,   Y. I. Nissim,   F. Houzay,  

 

期刊: Journal of Applied Physics  （AIP Available online 1986）
卷期: Volume 59, issue 7  

页码: 2444-2446

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.336347

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The usefulness of cw laser irradiation for semiconductor surface processing is evaluated. While perfect surface cleaning has not yet been obtained, surface annealing of silicon by this technique equals and even beats classical techniques or pulsed‐laser irradiation. cw laser ‘‘writing’’ of fine surface patterns is also demonstrated.

 

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