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A reactive sputtering model applied to AlN

 

作者: H. Öfner,   R. Zarwasch,   E. Rille,   H. K. Pulker,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1991）
卷期: Volume 9, issue 5  

页码: 2795-2796

 

ISSN:0734-2101

 

年代: 1991

 

DOI:10.1116/1.577202

 

出版商: American Vacuum Society

 

关键词: ALUMINIUM NITRIDES;HYSTERESIS;CATHODE SPUTTERING;GAS FLOW;ENERGY DEPENDENCE;ALUMINIUM

 

数据来源: AIP

 

摘要:

To the model of reactive sputtering of Bergetal. [S. Berg, H.‐O. Blom, T. Larsson, C. Nender, J. Vac. Sci. Technol. A5, 202 (1987)] an energy dependent sputtering yield was introduced. Calculated hysteresis curves were in good agreement with measurements.

 

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