Characterization of Ion‐implantation in Silicon by using Laser Infrared Photo‐Thermal Radiometry (PTR)
作者:
J. A. Garcia,
X. Guo,
A. Mandelis,
A. Simmons,
B. Li,
期刊:
AIP Conference Proceedings
(AIP Available online 1903)
卷期:
Volume 683,
issue 1
页码: 744-747
ISSN:0094-243X
年代: 1903
DOI:10.1063/1.1622553
出版商: AIP
数据来源: AIP
摘要:
Non‐contact, non‐intrusive photo‐thermal radiometry (PTR) was used for monitoring the ion implantation of (p‐type) industrial‐grade silicon wafers. The silicon wafers were implanted with Boron in the dose range of 1×1011‐to‐1×1016ions/cm2at different implantation energies (10 keV‐to‐180 keV). The results indicated excellent sensitivity to the implantation doses and energies. This laser‐based photothermal technique monitors harmonically photoexcited and recombining carriers and shows great potential advantages over existing methodologies for characterization of multiple semiconductor processes such as ion implantation and other device fabrication steps in the Si wafer processing industry. © 2003 American Institute of Physics
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