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Electron diffraction due to a reflection grating in a conducting wire

 

作者: KyoungWan Park,   Seongjae Lee,   Mincheol Shin,   Jong Seol Yuk,   El-Hang Lee,   Hyuk Chan Kwon,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 24  

页码: 3555-3557

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120389

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We report on quantum transport in the presence of an electron reflection grating fabricated within a high electron mobility transistor structure. The grating was composed of a periodically corrugated potential wall by which the electron waves are diffracted. The low temperature conductance shows a number of peaks with respect to the gate voltage, which are consistent with the electron diffraction effect and are predicted by the Fraunhofer diffraction condition. ©1997 American Institute of Physics.

 

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