Electron diffraction due to a reflection grating in a conducting wire
作者:
KyoungWan Park,
Seongjae Lee,
Mincheol Shin,
Jong Seol Yuk,
El-Hang Lee,
Hyuk Chan Kwon,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 24
页码: 3555-3557
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120389
出版商: AIP
数据来源: AIP
摘要:
We report on quantum transport in the presence of an electron reflection grating fabricated within a high electron mobility transistor structure. The grating was composed of a periodically corrugated potential wall by which the electron waves are diffracted. The low temperature conductance shows a number of peaks with respect to the gate voltage, which are consistent with the electron diffraction effect and are predicted by the Fraunhofer diffraction condition. ©1997 American Institute of Physics.
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