首页   按字顺浏览 期刊浏览 卷期浏览 Characterization of defect geometries in multilayer optical coatings
Characterization of defect geometries in multilayer optical coatings

 

作者: R. J. Tench,   R. Chow,   M. R. Kozlowski,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  (AIP Available online 1994)
卷期: Volume 12, issue 5  

页码: 2808-2813

 

ISSN:0734-2101

 

年代: 1994

 

DOI:10.1116/1.578948

 

出版商: American Vacuum Society

 

关键词: MIRRORS;HAFNIUM OXIDES;SILICON OXIDES;TOPOGRAPHY;DEFECTS;PHYSICAL RADIATION EFFECTS;LASER RADIATION;SCANNING ELECTRON MICROSCOPY;HfO2;SiO2

 

数据来源: AIP

 

摘要:

Laser‐induced damage in optical coatings is generally associated with micrometer‐scale defects. A simple geometric model for nodule‐shaped defects is commonly used to describe defects in optical coatings. No systematic study has been done, however, to prove the applicability of that model to an optical coating deposition process. Not all defects have a classic nodule geometry. The present study uses atomic force microscopy (AFM) and scanning electron microscopy to characterize the topography of coating defects in a HfO2/SiO2multilayer mirror system. Focused ion‐beam cross sectioning is then used to study the underlying defect structure. This work develops a model for defect shape such that the overall geometry of a coating defect, particularly the seed size and depth, can be inferred from nondestructive evaluation measurements such as AFM. The relative mechanical stabilities of nodular defects can be deduced based on the nodule’s geometry. Auger analysis showed that the seed material that causes nodular defects in HfO2/SiO2multilayers is a hafnia oxide. Such characterization capabilities are needed for understanding the enhanced susceptibility of particular defects to laser damage and for developing improved techniques for depositing low‐defect density coatings.

 

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