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Influence of phosphorus‐induced point defects on a gold‐gettering mechanism in silicon

 

作者: D. Lecrosnier,   J. Paugam,   F. Richou,   G. Pelous,   F. Beniere,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 2  

页码: 1036-1038

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.327732

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Deep‐level transient spectroscopy (DLTS) and neutron‐activation analysis have been applied to measure the gold distribution after a phosphorus gettering step. It is found that the gettering mechanism is able to operate without induced dislocations but depends mainly on the surface phosphorus concentration. For example, whenCs=1021/cm3, the gold concentration is reduced by a factor 103over the whole thickness of a wafer. This Au trapping phenomenon is attributed to the presence of a phosphorus‐induced point defect and related to the emitter push effect mechanism.

 

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