Influence of phosphorus‐induced point defects on a gold‐gettering mechanism in silicon
作者:
D. Lecrosnier,
J. Paugam,
F. Richou,
G. Pelous,
F. Beniere,
期刊:
Journal of Applied Physics
(AIP Available online 1980)
卷期:
Volume 51,
issue 2
页码: 1036-1038
ISSN:0021-8979
年代: 1980
DOI:10.1063/1.327732
出版商: AIP
数据来源: AIP
摘要:
Deep‐level transient spectroscopy (DLTS) and neutron‐activation analysis have been applied to measure the gold distribution after a phosphorus gettering step. It is found that the gettering mechanism is able to operate without induced dislocations but depends mainly on the surface phosphorus concentration. For example, whenCs=1021/cm3, the gold concentration is reduced by a factor 103over the whole thickness of a wafer. This Au trapping phenomenon is attributed to the presence of a phosphorus‐induced point defect and related to the emitter push effect mechanism.
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