Independent parallel lithography using the atomic force microscope
作者:
S. C. Minne,
S. R. Manalis,
A. Atalar,
C. F. Quate,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1996)
卷期:
Volume 14,
issue 4
页码: 2456-2461
ISSN:1071-1023
年代: 1996
DOI:10.1116/1.588753
出版商: American Vacuum Society
关键词: SILICON;MICROSCOPES;OXIDATION;PROBES;COMPUTERIZED CONTROL SYSTEMS;Si
数据来源: AIP
摘要:
Independent parallel features have been lithographically patterned with a 2×1 array of individually controlled cantilevers using an atomic force microscope. Control of the individual cantilevers was achieved with an integrated piezoelectric actuator in feedback with a piezoresistive sensor. Patterns were formed on 〈100〉 single crystal silicon by using a computer controlled tip voltage to locally enhance the oxidation of the silicon. Using the piezoresistor directly as a force sensor, parallel images can be simultaneously acquired in the constant force mode. A discussion of electrostatic forces due to applied tip voltages, hysteresis characteristics of the actuator, and the cantilever system is also presented.
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