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Independent parallel lithography using the atomic force microscope

 

作者: S. C. Minne,   S. R. Manalis,   A. Atalar,   C. F. Quate,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1996)
卷期: Volume 14, issue 4  

页码: 2456-2461

 

ISSN:1071-1023

 

年代: 1996

 

DOI:10.1116/1.588753

 

出版商: American Vacuum Society

 

关键词: SILICON;MICROSCOPES;OXIDATION;PROBES;COMPUTERIZED CONTROL SYSTEMS;Si

 

数据来源: AIP

 

摘要:

Independent parallel features have been lithographically patterned with a 2×1 array of individually controlled cantilevers using an atomic force microscope. Control of the individual cantilevers was achieved with an integrated piezoelectric actuator in feedback with a piezoresistive sensor. Patterns were formed on 〈100〉 single crystal silicon by using a computer controlled tip voltage to locally enhance the oxidation of the silicon. Using the piezoresistor directly as a force sensor, parallel images can be simultaneously acquired in the constant force mode. A discussion of electrostatic forces due to applied tip voltages, hysteresis characteristics of the actuator, and the cantilever system is also presented.

 

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