Diffusional Properties of the Stage‐III Defect in Copper. III. Bulk Diffusion
作者:
D. O. Thompson,
O. Buck,
期刊:
Journal of Applied Physics
(AIP Available online 1967)
卷期:
Volume 38,
issue 8
页码: 3068-3074
ISSN:0021-8979
年代: 1967
DOI:10.1063/1.1710064
出版商: AIP
数据来源: AIP
摘要:
An analysis of the bulk diffusion properties of the stage‐III defect is given utilizing the experimental results presented in Part I. It is found that the motion energy of the defect is 0.64±0.03 eV and, in addition, it is shown that this is a true motion energy and not a defect‐impurity‐atom binding energy. After consideration of the extremely small lattice‐defect concentrations used (≤10−12), available information concerning single‐vacancy motion energies, and the simple‐defect spectrum produced by the &ggr; irradiation, it is concluded that the stage‐III defect can only be identified as a freely migrating interstitial atom.
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