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CRITICAL CURRENT DENSITIES IN SUPERCONDUCTING NIOBIUM FILMS SPUTTERED REACTIVELY IN THE PRESENCE OF NITROGEN GAS

 

作者: Y. Muto,   N. Koto,   T. Fukuroi,   Y. Saito,   T. Anayama,   T. Mitsuoka,   Y. Onodera,  

 

期刊: Applied Physics Letters  （AIP Available online 1968）
卷期: Volume 13, issue 6  

页码: 204-205

 

ISSN:0003-6951

 

年代: 1968

 

DOI:10.1063/1.1652571

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A critical current density of about 2 × 105A/cm2in a transverse external field of 73 kOe, parallel to the film plane, was obtained at liquid‐helium temperature for niobium films deposited on glass substrates by sputtering technique in an argon atmosphere with a dilute addition of nitrogen. This critical current density is larger than any other reported values for refractory metal carbides and nitrides with the NaCl structure.

 

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