The influence of InAs well thickness on the negative differential resistance behaviors in GaSb/AlSb/InAs/GaSb/AlSb/InAs double barrier structures
作者:
M. P. Houng,
Y. H. Wang,
C. L. Shen,
M. H. Liu,
J. F. Chen,
A. Y. Cho,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1992)
卷期:
Volume 10,
issue 2
页码: 1048-1050
ISSN:1071-1023
年代: 1992
DOI:10.1116/1.586412
出版商: American Vacuum Society
关键词: IV CHARACTERISTIC;INDIUM ARSENIDES;GALLIUM ANTIMONIDES;ALUMINIUM ANTIMONIDES;TUNNEL EFFECT;MOLECULAR BEAM EPITAXY;BINARY COMPOUNDS;GaSb;AlSb
数据来源: AIP
摘要:
The peak‐to‐valley current ratio can be improved by adding a thin InAs layer in the well region of the GaSb/AlSb/GaSb/AlSb/InAs resonant interband tunneling structure. It is found that the ratio rises to more than 20 at room temperature for an InAs layer reaching 30 Å. Increasing the InAs layer beyond 30 Å the ratio gradually goes down. However, we also find as the added InAs layer is further increased to 240 Å, theI–Vcharacteristics change from single negative differential resistance (NDR) to multiple NDR behavior. Such interesting phenomena can be modeled theoretically due to the coupling effect of the electrons from the added InAs layer and the light holes from the GaSb layer in the well region.
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