Defects in organometallic vapor‐phase epitaxy‐grown GaInP layers
作者:
S. L. Feng,
J. C. Bourgoin,
F. Omnes,
M. Razeghi,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 59,
issue 8
页码: 941-943
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.106308
出版商: AIP
数据来源: AIP
摘要:
Nonintentionally doped metalorganic vapor‐phase epitaxy Ga1−xInxP layers, having an alloy composition (x= 0.49) corresponding to a lattice matched to GaAs, grown by metalorganic chemical vapor deposition, have been studied by capacitance‐voltage and deep‐ level transient spectroscopy techniques. They are found to exhibit a free‐carrier concentration at room temperature of the order of 1015cm−3. Two electron traps have been detected. The first one, at 75 meV below the conduction band, is in small concentration (∼ 1013cm−3) while the other, at about 0.9 eV and emitting electrons above room temperature, has a concentration in the range 1014–1015cm−3.
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