Nanoscale imaging of the electronic tunneling barrier at a metal surface
作者:
G. R. Condon,
J. A. Panitz,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1998)
卷期:
Volume 16,
issue 1
页码: 23-29
ISSN:1071-1023
年代: 1998
DOI:10.1116/1.589787
出版商: American Vacuum Society
数据来源: AIP
摘要:
A photometric field-emission electron microscopy technique is described by which the spatial structure of the surface electronic tunneling barrier can be mapped with nanometer resolution. The technique involves performing a Fowler–Nordheim analysis on luminosity data extracted from a set of digitized field-emission images taken over a range of voltages. This approach is equivalent to older probe-hole methods, but with greatly improved spatial resolution and data accumulation rate. Virtual probe holes of arbitrary size and shape can be constructed by integrating over subregions in the field-emission images. Performance of a system utilizing this technique is demonstrated by measuring the work functions of the (111) and (100) crystallographic planes of a clean tungsten field emitter. Applications of this technique to adsorption phenomena and field-emission display technology are also discussed.
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