Application of a novel contactless conductivity sensor in chemical vapor deposition of aluminum films
作者:
A. V. Ermakov,
B. J. Hinch,
期刊:
Review of Scientific Instruments
(AIP Available online 1997)
卷期:
Volume 68,
issue 3
页码: 1571-1574
ISSN:0034-6748
年代: 1997
DOI:10.1063/1.1147927
出版商: AIP
数据来源: AIP
摘要:
A novel contactless method for conductivity sensing is introduced that utilizes a driving coil and two tunable and near resonant coils. The design uses only inexpensive electronic components and a variable frequency rf generator. An algebraic expression for the response has been derived and simulations indicate a linear response to surface conductivity changes over at least four orders of magnitude. The sensitivity is shown to depend on the conductivity of the substrate, with a limit to conductivity changes as low as 10−4&OHgr;−1for insulating substrates. An ultrahigh vacuum compatible version of this probe has been used to monitorin situaluminum thin film growth by chemical vapor deposition on a native oxide covered, highly doped, Si(111) wafer. On this semiconducting substrate (3 &OHgr;−1) a sensitivity to sheet conductivity changes as low as ∼2×10−2&OHgr;−1has been demonstrated. The Al films show a discrete jump in differential sheet conductivity associated with Al cluster coalescence during growth. ©1997 American Institute of Physics.
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