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Application of a novel contactless conductivity sensor in chemical vapor deposition of aluminum films

 

作者: A. V. Ermakov,   B. J. Hinch,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1997)
卷期: Volume 68, issue 3  

页码: 1571-1574

 

ISSN:0034-6748

 

年代: 1997

 

DOI:10.1063/1.1147927

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A novel contactless method for conductivity sensing is introduced that utilizes a driving coil and two tunable and near resonant coils. The design uses only inexpensive electronic components and a variable frequency rf generator. An algebraic expression for the response has been derived and simulations indicate a linear response to surface conductivity changes over at least four orders of magnitude. The sensitivity is shown to depend on the conductivity of the substrate, with a limit to conductivity changes as low as 10−4&OHgr;−1for insulating substrates. An ultrahigh vacuum compatible version of this probe has been used to monitorin situaluminum thin film growth by chemical vapor deposition on a native oxide covered, highly doped, Si(111) wafer. On this semiconducting substrate (3 &OHgr;−1) a sensitivity to sheet conductivity changes as low as ∼2×10−2&OHgr;−1has been demonstrated. The Al films show a discrete jump in differential sheet conductivity associated with Al cluster coalescence during growth. ©1997 American Institute of Physics.

 

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