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Work Function of Ultrahigh‐Vacuum‐Deposited Beryllium Films

 

作者: R. D. Dixon,   L. A. Lott,  

 

期刊: Journal of Applied Physics  （AIP Available online 1969）
卷期: Volume 40, issue 12  

页码: 4938-4939

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1657317

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The work function of ultrahigh‐vacuum‐deposited beryllium films was measured to be 5.08±0.08 eV. Upon exposure of freshly deposited films to pure oxygen at pressures of 5×10−7Torr, the work function was observed to decrease rapidly to a stable value of 3.60±0.05 eV.

 

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