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Apparatus Design for Glow-Discharge a-Si: H Film-Deposition

 

作者: A. GALLAGHER,  

 

期刊: International Journal of Solar Energy  (Taylor Available online 1987)
卷期: Volume 5, issue 5-6  

页码: 311-322

 

ISSN:0142-5919

 

年代: 1987

 

DOI:10.1080/01425918708914428

 

出版商: Taylor & Francis Group

 

关键词: film deposition;hydrogenated amorphous silicon

 

数据来源: Taylor

 

摘要:

We draw attention here to several important details of a discharge deposition apparatus, and to how these can affect him quality. In addressing why these details are important, we will suggest some reasons for how and why film quality depends on deposition conditions, and what might be done to improve both film quality and deposition rate. We concentrate on what appear to be three major causes of poor film quality: deposition of microparticulates, ion bombardment of the growing film surface, and growth by sticky radicals (radicals with a high sticking coefficient to the surface).

 

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