Apparatus Design for Glow-Discharge a-Si: H Film-Deposition
作者:
A. GALLAGHER,
期刊:
International Journal of Solar Energy
(Taylor Available online 1987)
卷期:
Volume 5,
issue 5-6
页码: 311-322
ISSN:0142-5919
年代: 1987
DOI:10.1080/01425918708914428
出版商: Taylor & Francis Group
关键词: film deposition;hydrogenated amorphous silicon
数据来源: Taylor
摘要:
We draw attention here to several important details of a discharge deposition apparatus, and to how these can affect him quality. In addressing why these details are important, we will suggest some reasons for how and why film quality depends on deposition conditions, and what might be done to improve both film quality and deposition rate. We concentrate on what appear to be three major causes of poor film quality: deposition of microparticulates, ion bombardment of the growing film surface, and growth by sticky radicals (radicals with a high sticking coefficient to the surface).
点击下载:
PDF (286KB)
返 回