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A thin-film transistor with polytetrafluoroethylene as insulator

 

作者: A.De Vos,   B.Hindryckx,  

 

期刊: IEE Proceedings I (Solid-State and Electron Devices)  (IET Available online 1980)
卷期: Volume 127, issue 1  

页码: 42-44

 

年代: 1980

 

DOI:10.1049/ip-i-1.1980.0008

 

出版商: IEE

 

数据来源: IET

 

摘要:

The fabrication and performance characteristics of a new kind of thin-film transistor is presented. The novelty consists of the use of a thin polymer film as an insulator between gate and semiconductor film. The insulator used is polytetrafluoroethylene film, evaporated by an electron gun. The semiconductor used is a tellurium film, evaporated by resistive heating. The transistor shows useful current/voltage characteristics, but the isulator and the insulator – semiconductor interface show slow-drift phenomena, analogous to the drift seen in most conventional thin-film transistors with an inorganic insulator film.

 

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