A thin-film transistor with polytetrafluoroethylene as insulator
作者:
A.De Vos,
B.Hindryckx,
期刊:
IEE Proceedings I (Solid-State and Electron Devices)
(IET Available online 1980)
卷期:
Volume 127,
issue 1
页码: 42-44
年代: 1980
DOI:10.1049/ip-i-1.1980.0008
出版商: IEE
数据来源: IET
摘要:
The fabrication and performance characteristics of a new kind of thin-film transistor is presented. The novelty consists of the use of a thin polymer film as an insulator between gate and semiconductor film. The insulator used is polytetrafluoroethylene film, evaporated by an electron gun. The semiconductor used is a tellurium film, evaporated by resistive heating. The transistor shows useful current/voltage characteristics, but the isulator and the insulator – semiconductor interface show slow-drift phenomena, analogous to the drift seen in most conventional thin-film transistors with an inorganic insulator film.
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