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Steady‐state rf magnetron discharges

 

作者: Lin I,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 58, issue 8  

页码: 2981-2987

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.335847

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A study of the steady‐state discharges and the spatial distributions of plasma parameters vertical to the magnetic field was made in an rf magnetron with oval cross section. Langmuir probes were used for the major diagnostics. The device generates low‐ion energy, high‐ion flux stable plasma (Ei∼102eV, &Ggr;i∼5 mA/cm2at 1 W/cm2rf power). Ion transport toward the positive sheath is enhanced by the rf induced dc electric field in the uniform glow. The state of the glow is independent of rf power except ion densityni∝ (rf power)&agr;. The voltage drop across the sheath followsV∝(rf power) &bgr;with 0<&agr;<&bgr;<1. The discharge strongly depends on magnetic field strength and system pressure, and weakly depends on the gas chemistry. Generally, the state of the discharge is determined by charged particle generation, transport and loss processes, and in turn controlled by the system operating parameters. The experimental results obey the conservation laws and the steady‐state criterion. The correlations between plasma parameters and system parameters are investigated and discussed.

 

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