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Ionenstrahlätzen – Verfahren und Ausrüstungen für die Mikrostrukturierung
作者: F. Bigl,
期刊:
Isotopenpraxis Isotopes in Environmental and Health Studies
（Taylor Available online 1986）
页码: 430-435
ISSN:0021-1915
年代: 1986
DOI:10.1080/10256018608623720
出版商: Taylor & Francis Group
关键词: etching;ion beams;ion sources;surface finishing;semiconductor materials;silicon;silicon compounds;sputtering
数据来源: Taylor
摘要: Ion beam techniques are widely used jur modification as well us analysis of materials in development and production of VLSI circuits and their importance is continuously increased in course of the reduction of structure dimensions. Some possibilities and problems connected with the application of ion beams of low energy in the pattern transfer are- described and the stage of development achieved in the Central Institute of Isotope and Radiation Research is outlined.
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