Tunneling and Resistive Determinations of the Transition Temperature of Thin Lead Films
作者:
W. L. Feldmann,
J. M. Rowell,
期刊:
Journal of Applied Physics
(AIP Available online 1969)
卷期:
Volume 40,
issue 1
页码: 312-314
ISSN:0021-8979
年代: 1969
DOI:10.1063/1.1657050
出版商: AIP
数据来源: AIP
摘要:
The transition temperatureTcof a lead film has been determined from both the resistance along the film and from tunnel measurements of an aluminum‐aluninum‐oxide‐lead junction.Tcby resistivity was 7.214°K and from tunneling 7.208°K. The agreement indicates that tunneling measurements may be used for accurate determinations of the transition temperature.
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