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Tunneling and Resistive Determinations of the Transition Temperature of Thin Lead Films

 

作者: W. L. Feldmann,   J. M. Rowell,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 1  

页码: 312-314

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1657050

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The transition temperatureTcof a lead film has been determined from both the resistance along the film and from tunnel measurements of an aluminum‐aluninum‐oxide‐lead junction.Tcby resistivity was 7.214°K and from tunneling 7.208°K. The agreement indicates that tunneling measurements may be used for accurate determinations of the transition temperature.

 

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