Sputtered amorphous Fe–Te films: Structural and electrical studies
作者:
Kiyoshi Chiba,
Kazuto Tokumitsu,
Hiromitsu Ino,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 60,
issue 3
页码: 1019-1024
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.337391
出版商: AIP
数据来源: AIP
摘要:
Thin films of an iron–tellurium alloy were prepared by rf sputtering and characterized by means of x‐ray diffraction and Mo¨ssbauer spectroscopy. In an immiscible range in equilibrium composition, tellurium atoms were incorporated into iron, distorting the lattice to some extent. Beyond 14 at. % of Te, an amorphous structure appeared. Judging from the metastable superstructures formed at higher substrate temperatures and the covalent nature in the bonding, the kinetic hindrance against the redistribution of the elements due to the local atomic forces during rapid quenching plays a critical role in the formation of amorphous structure in this alloy. In addition, beyond some intermetallic range around 60 at. % Te, an amorphous phase also exists in the tellurium‐rich region. The thermal stability was examined by a differential scanning calorimetry; the electrical resistivity is also discussed.
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