Conduction in nonstoichiometric molecular-beam epitaxial GaAs grown above the critical thickness
作者:
P. Kordosˇ,
M. Marso,
M. Luysberg,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 72,
issue 15
页码: 1851-1853
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.121204
出版商: AIP
数据来源: AIP
摘要:
Different conduction behavior is observed in nonstoichiometric (NS) molecular-beam epitaxial GaAs grown at 200 °C below and above the critical thickness. In the low-field Ohmic region only the monocrystalline part of the layer contributes to the room-temperature resistivity, but at higher temperatures the resistivity scales with the total layer thickness. In NS GaAs grown above the critical thickness, a superlinearJ–Vn(n=2–3)dependence is found at intermediate fields. The prebreakdown voltage is proportional to the total thickness. This indicates that different defects control the electrical properties of the polycrystalline and monocrystalline parts of the NS GaAs. These results can be useful in the design of NS GaAs based devices, which operate at higher temperature and/or higher electric fields. ©1998 American Institute of Physics.
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