Insitufabrication of epitaxial YBa2Cu3O7films on lattice‐mismatched (100) YS‐ZrO2substrates by the pulsed laser evaporation method
作者:
R. K. Singh,
J. Narayan,
A. K. Singh,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 67,
issue 7
页码: 3452-3455
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.345333
出版商: AIP
数据来源: AIP
摘要:
The formation of good quality epitaxialc‐axis‐perpendicular YBa2Cu3O7superconducting thin films on (100) yttria‐stabilized‐zirconia (YSZ) substrates in the temperature range of 550–650 °C by a biased laser deposition method is reported. However, below 550 °C, the epitaxial quality of the films decreased appreciably with corresponding changes in the superconducting properties. For temperatures much below the critical temperature, the critical current density showed a linear variation with temperature, with a value of 1.0×106A/cm2at 77 K and zero magnetic field. Because of the lattice mismatch between the substrate and the film, the interface was found to be highly strained in the presence of a large number of defects. The epitaxial nature and the crystalline quality of the films were determined by a number of techniques including Rutherford backscattering/channeling, electron channeling, cross‐section transmission electron microscopy (TEM), and x‐ray diffraction techniques. Rutherford backscattering channeling showed a minimum channeling yield of about 18%–25% for films deposited at and above 550 °C. Cross‐section TEM and x‐ray diffraction revealed the following thin film and substrate relationships: [001]film∥[001]YSZand [110]film∥[100]YSZ. The electron channeling pattern taken from a large area confirmed the epitaxial relationship. The lattice parameters mismatch in this orientation has been found to gives rise to stresses near the interface.
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