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Insitufabrication of epitaxial YBa2Cu3O7films on lattice‐mismatched (100) YS‐ZrO2substrates by the pulsed laser evaporation method

 

作者: R. K. Singh,   J. Narayan,   A. K. Singh,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 67, issue 7  

页码: 3452-3455

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.345333

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The formation of good quality epitaxialc‐axis‐perpendicular YBa2Cu3O7superconducting thin films on (100) yttria‐stabilized‐zirconia (YSZ) substrates in the temperature range of 550–650 °C by a biased laser deposition method is reported. However, below 550 °C, the epitaxial quality of the films decreased appreciably with corresponding changes in the superconducting properties. For temperatures much below the critical temperature, the critical current density showed a linear variation with temperature, with a value of 1.0×106A/cm2at 77 K and zero magnetic field. Because of the lattice mismatch between the substrate and the film, the interface was found to be highly strained in the presence of a large number of defects. The epitaxial nature and the crystalline quality of the films were determined by a number of techniques including Rutherford backscattering/channeling, electron channeling, cross‐section transmission electron microscopy (TEM), and x‐ray diffraction techniques. Rutherford backscattering channeling showed a minimum channeling yield of about 18%–25% for films deposited at and above 550 °C. Cross‐section TEM and x‐ray diffraction revealed the following thin film and substrate relationships: [001]film∥[001]YSZand [110]film∥[100]YSZ. The electron channeling pattern taken from a large area confirmed the epitaxial relationship. The lattice parameters mismatch in this orientation has been found to gives rise to stresses near the interface.

 

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