A new model for the diffusion of arsenic in polycrystalline silicon
作者:
A. G. O’Neill,
C. Hill,
J. King,
C. Please,
期刊:
Journal of Applied Physics
(AIP Available online 1988)
卷期:
Volume 64,
issue 1
页码: 167-174
ISSN:0021-8979
年代: 1988
DOI:10.1063/1.341450
出版商: AIP
数据来源: AIP
摘要:
Experimental data are presented for the diffusion of arsenic in polycrystalline silicon (polysilicon) during a 15‐min anneal at 900 °C. A new model is used to describe the data, which takes account of the different dopant diffusion rates in grains and in grain boundaries. The model is divided into early and late stages and, in particular, the early stage model identifies grain growth as the major mechanism by which arsenic transfers from the grains to the grain boundaries. In the late stage model, grain growth can be ignored and analytic solutions for the arsenic concentration are derived.
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