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Metal‐organic chemical vapor deposition (MOCVD) of high temperature superconductors with enhanced critical current

 

作者: Alain E. Kaloyeros,   Aiguo Feng,   Elke Jahn,   Kennethy C. Brooks,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1991)
卷期: Volume 219, issue 1  

页码: 470-477

 

ISSN:0094-243X

 

年代: 1991

 

DOI:10.1063/1.40280

 

出版商: AIP

 

数据来源: AIP

 

摘要:

High quality Y‐Ba‐Cu‐O thin films were produced on single‐crystal Mgo and SrTiO3by metal‐organic chemical vapor deposition (MOVD) using metal chelates of &bgr;‐diketonate ligands. The films were grown in a cold‐wall CVD reactor at a reactor pressure of 10 torr and substrate temperature in the range 700–900 °C. Characterization studies were performed using Rutherford Backscattering (RBS), Auger electron spectroscopy (AES), scanning electron microscopy (SEM), and energy‐dispersive x‐ray spectroscopy (EDXS). The studies showed that the films were uniform, continuous, adherent and highly pure. Four point resistivity measurements showed that films had a sharp superconducting transition at 92 K and exhibited critical current densities of ∼5–106A/Cm2(B=0, T=77K).

 

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