The germination and growth of wheat seedlings were studied at pH 5.5 in liquid growth media with organic acids in concentrations ranging from 800 to 1200 ppm, before and after interaction of the organic acids with montmorillonite and hydroxy‐Al montmorillonite. Germination was not affected by the organic acids, but subsequent growth was dependent on the kind and concentration of organic acid in the growth medium. Acetic acid was more inhibitory than citric acid. Gallic acid polymerized at pH 5.5 and was phytotoxic at 1200 ppm. Interaction of organic acids with montmorillonite and hydroxy‐Al montmorillonite reduced the concentration of organic acids in solution by adsorption. Despite this reduction in concentration the phytotoxicity of the growth media was enhanced after the interaction. This was caused by the dissolution of surface Al and the effect was more pronounced in cases where hydroxy‐Al interlayered montmorillonite was the adsorbent. Additions of P as KH2PO4alleviated the phytotoxicity of organic acids but not the associated Al toxicity. The amount of P lost by adsorption or precipitation was dependent on the form of Al in the growth media.