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Photoemission studies of the interaction of hydrogen plasmas with GaAs(001)

 

作者: P. Friedel,   P. K. Larsen,   S. Gourrier,   J. P. Cabanie,   W. M. Gerits,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1984)
卷期: Volume 2, issue 4  

页码: 675-680

 

ISSN:0734-211X

 

年代: 1984

 

DOI:10.1116/1.582861

 

出版商: American Vacuum Society

 

关键词: GALLIUM ARSENIDES;PHOTOEMISSION;SYNCHROTRON RADIATION;RHEED;HYDROGEN;PLASMA−WALL INTERACTIONS;VALENCE BANDS;ETCHING;MOLECULAR BEAM EPITAXY;GaAs

 

数据来源: AIP

 

摘要:

The interaction between hydrogen plasmas and a (001) surface of GaAs grown by molecular beam epitaxy is studied by photoemission using synchrotron radiation and reflection high energy electron diffraction (RHEED). Measurements of the As(3d) and Ga(3d) core levels show that the interaction is complex and bonding to both As and Ga occurs. It is seen from RHEED measurements that plasma exposures lead to an unreconstructed and partly disordered surface. Valence band studies by angle resolved photoemission show a prominent hydrogen induced feature in the heteropolar gap at an energy 7.7 eV below the valence band maximum.

 

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