The sensitivity of the Ag2Te/As2S3system has been measured as a top‐surface imaging, negative‐tone resist between 632.8 and 193 nm. The sensitivity atg‐line (435.8 nm) andi‐line (365 nm) is of the order of 5 and 0.5 J/cm2, respectively, and is much too low to take advantage of the significant advantages of this resist. These advantages are high contrast (∼10), an edge effect which compensates for the reduction of optical intensity at line edges and latent image formation in a layer whose thickness is significantly less than the depth‐of‐focus of high resolution stepper optical systems. Measurements at 248 and 193 nm show significantly higher sensitivity of 350 and 80 mJ/cm2, respectively, suggesting that this system may possess practical potential at these wavelengths. Exposures on a GCA XLS‐7500 stepper with 0.42 NA at 365 nm have yielded 0.35 μm linewidths.