首页   按字顺浏览 期刊浏览 卷期浏览 Formation of elemental Ag precipitates in AlGaAs by ion implantation and thermal anneal...
Formation of elemental Ag precipitates in AlGaAs by ion implantation and thermal annealing

 

作者: J. C. P. Chang,   J. Ye,   M. R. Melloch,   D. T. Crouse,   D. D. Nolte,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 24  

页码: 3501-3503

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120372

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We report transmission electron microscopy (TEM) studies of precipitation in Ag-implanted and annealedAl0.3Ga0.7As.Silver was chosen because it does not form compounds with Ga and/or As when precipitating based on bulk thermodynamics arguments. TEM confirmed the formation of an elemental metal/semiconductor composite, which consists of nanometer-sized Ag (fcc structure) precipitates dispersed in the matrix. The precipitates are nonspherical and have an orientation relationship toAl0.3Ga0.7Asof (200)Ag//(200)AlGaAs, (02-2)Ag//(02-2)AlGaAs, and [011]Ag//[011]AlGaAs. High temperature (900 °C) anneals transform the phase of the precipitate to hexagonal,Ag3(GaAl)compounds. This shape distribution has been correlated with inhomogeneous broadening of the optical absorption. ©1997 American Institute of Physics.

 

点击下载:  PDF (411KB)



返 回