首页   按字顺浏览 期刊浏览 卷期浏览 Near‐field direct‐write ultraviolet lithography and shear force microscop...
Near‐field direct‐write ultraviolet lithography and shear force microscopic studies of the lithographic process

 

作者: Igor I. Smolyaninov,   David L. Mazzoni,   Christopher C. Davis,  

 

期刊: Applied Physics Letters  （AIP Available online 1995）
卷期: Volume 67, issue 26  

页码: 3859-3861

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115297

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Direct‐write lithography on a 100 nm scale has been carried out using the near‐field optical interaction between an uncoated tapered fiber tip and a layer of photoresist. This allows both lithography and shear force microscopic examination of the surface, which reveals morphological changes in the photoresist before development. ©1995 American Institute of Physics.

 

点击下载:  PDF (476KB)



返 回