A new approach to prepare thin films in a pulsed inductive silane discharge is attemped. The time‐resolved spectral lines qualitatively clarified dynamics of decomposition process in the pulsed silane discharge and the local thermodynamic equilibrium in this discharge was investigated by the population density distribution estimated from excitation temperature measurement. The films had peculiar deposition patterns with good adhesion due to electromagnetic effects and main group of infrared spectra was the SiH3complex.