Production Scale Electron-Beam Systems for Thin-Film Applications
作者:
Walter G. Overacker,
期刊:
Journal of Vacuum Science and Technology
(AIP Available online 1971)
卷期:
Volume 8,
issue 1
页码: 357-360
ISSN:0022-5355
年代: 1971
DOI:10.1116/1.1316338
出版商: American Vacuum Society
数据来源: AIP
摘要:
This paper describes recent advances in the design and operation of automated systems which lock the work in and out of the evaporation area. The latter is maintained under vacuum at all times with the sources in a continuously ready state. Systems have been produced for up to five sequential or graded coatings and for alloys. Each deposition is monitored and each step must be completed to specification before the next step can be started. Very high production rates can be achieved, and users report the end product superior to that obtained from batch systems opened to air between loads. Operation of such systems over long periods has created some unique operating problems and solutions.
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