Evidence of interface trap creation by hot‐electrons in AlGaAs/GaAs high electron mobility transistors
作者:
Gaudenzio Meneghesso,
Alessandro Paccagnella,
Youcef Haddab,
Claudio Canali,
Enrico Zanoni,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 10
页码: 1411-1413
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117598
出版商: AIP
数据来源: AIP
摘要:
We report on the hot‐electrons induced degradation in AlGaAs/GaAs high electron mobility transistors (HEMTs), consisting of a decrease in the drain current and an increase in the parasitic drain resistance. The amount of the degradation is proportional to the impact‐ionization rate which is related to the electron energy. Transconductance dispersion measurements and drain current deep level transient spectroscopy (DLTS) have been used to identify interface traps which are located at the AlGaAs/GaAs interface in the gate‐drain access region and are the causes of the observed degradation. ©1996 American Institute of Physics.
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