On‐line Analysis of Process Chemicals by Inductively Coupled Plasma Mass Spectrometry (ICP‐MS)
作者:
Yoko Kishi,
Katsu Kawabata,
David Palsulich,
Dan Wiederin,
期刊:
AIP Conference Proceedings
(AIP Available online 1903)
卷期:
Volume 683,
issue 1
页码: 606-610
ISSN:0094-243X
年代: 1903
DOI:10.1063/1.1622534
出版商: AIP
数据来源: AIP
摘要:
An initial study of on‐line remote system for monitoring of trace metals using the inductively coupled plasma mass spectrometer equipped with dynamic reaction cell system is described. The three types of cleaning solutions (HF, SC‐1 and SC‐2) used in the traditional RCA clean procedure are analyzed periodically with one set of simple calibration curves to simulate the on‐line monitoring. A remote sampling system for on‐line monitoring with the combination of the ICP‐MS is also demonstrated. © 2003 American Institute of Physics
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