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Formation of partially coherent antimony precipitates in ion implanted thermally annealed silicon

 

作者: S. J. Pennycook,   J. Narayan,   O. W. Holland,  

 

期刊: Journal of Applied Physics  (AIP Available online 1983)
卷期: Volume 54, issue 12  

页码: 6875-6878

 

ISSN:0021-8979

 

年代: 1983

 

DOI:10.1063/1.331992

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Thermal annealing of a supersaturated solid solution of antimony in silicon results in the formation of partially coherent antimony precipitates. Transmission electron microscopy and microdiffraction studies show the precipitates to be bounded by {112} Si surfaces with the {111} Si and {1¯012} Sb planes coherent across the interface. The role of dislocations in the growth of the precipitates is discussed.

 

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