Mass analysis of negative ions in etching plasma
作者:
Naoki Mizutani,
Yasushi Nagata,
Akira Kubo,
Toshio Hayashi,
期刊:
Review of Scientific Instruments
(AIP Available online 1998)
卷期:
Volume 69,
issue 9
页码: 3437-3438
ISSN:0034-6748
年代: 1998
DOI:10.1063/1.1149119
出版商: AIP
数据来源: AIP
摘要:
Negative ions in etching plasma were extracted from a plasma chamber and mass spectra were measured. For the extraction of the negative ions, the plasma sheath was broken by a cone-shaped extractor electrode which had an orifice on the tip. To avoid disturbing the plasma, the tip of the extractor electrode was slightly stuck out of an electrically earthed wall. To remove electrons from the extracted negative charged flux, a magnetic field was applied to the flux. By using the extractor electrode and the magnetic field for the removal of the electrons, the negative ions could be extracted efficiently and the mass spectra could be measured with low noise. ©1998 American Institute of Physics.
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