首页   按字顺浏览 期刊浏览 卷期浏览 Mass analysis of negative ions in etching plasma
Mass analysis of negative ions in etching plasma

 

作者: Naoki Mizutani,   Yasushi Nagata,   Akira Kubo,   Toshio Hayashi,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1998)
卷期: Volume 69, issue 9  

页码: 3437-3438

 

ISSN:0034-6748

 

年代: 1998

 

DOI:10.1063/1.1149119

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Negative ions in etching plasma were extracted from a plasma chamber and mass spectra were measured. For the extraction of the negative ions, the plasma sheath was broken by a cone-shaped extractor electrode which had an orifice on the tip. To avoid disturbing the plasma, the tip of the extractor electrode was slightly stuck out of an electrically earthed wall. To remove electrons from the extracted negative charged flux, a magnetic field was applied to the flux. By using the extractor electrode and the magnetic field for the removal of the electrons, the negative ions could be extracted efficiently and the mass spectra could be measured with low noise. ©1998 American Institute of Physics.

 

点击下载:  PDF (39KB)



返 回