We report a flexible method for the patterning of organic semiconductors in the submicrometer range, which we have successfully applied to thin films of poly(p-phenylene vinylene) (PPV) prepared on a variety of substrates, such as quartz, indium–tin oxide coated glass, or inorganic dielectric mirrors. The method is based on holographic lithography performed by a corner cube interferometer of our own design and construction, followed by Ar-ion etching. ©1998 American Institute of Physics.