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Mechanism of Thermal Annihilation of Stacking Faults in GaAs

 

作者: M. S. Abrahams,   C. J. Buiocchi,  

 

期刊: Journal of Applied Physics  (AIP Available online 1970)
卷期: Volume 41, issue 6  

页码: 2358-2365

 

ISSN:0021-8979

 

年代: 1970

 

DOI:10.1063/1.1659230

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Epitaxial layers of GaAs grown from the liquid phase have been studied by transmission electron microscopy. The layers were grown on mechanically polished substrates and contain intrinsic stacking faults bounded by Shockley partial dislocations. Near each end of most of these grown‐in faults, there are three overlapping intrinsic faults. The two faults which overlap the grown‐in fault form by vacancy migration during growth and are bounded by Frank partials. Unfaulting of these three‐layer defects was observed on annealing and is accomplished by the nucleation and motion of Shockley partials. These unfaulting Shockley partials have been observed for the first time. The final state is one in which the total faulted structure is eliminated.

 

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