Schottky barrier formation and the initial metal–atom bonding state: InP(110)–Al vs GaAs(110)–Al
作者:
Te‐Xiu Zhao,
R. R. Daniels,
A. D. Katnani,
G. Margaritondo,
Alex Zunger,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1983)
卷期:
Volume 1,
issue 3
页码: 610-612
ISSN:0734-211X
年代: 1983
DOI:10.1116/1.582608
出版商: American Vacuum Society
关键词: adsorption;aluminium;photoemission;schottky barrier diodes;synthesis;synchrotron radiation
数据来源: AIP
摘要:
We investigated the adatom states for different Al coverages of InP(110) by synchrotron‐radiation photoemission, including ultralow coverages below 0.2 monolayer. The adatom states below 0.1 monolayer and above ∼3 monolayer appear similar to the corresponding Al–adatom states on GaAs(110). In particular, the results for both systems appear consistent with the formation of Al clusters at 0.1–2 monolayer coverage, and the Fermi‐level pinning occurs when the cluster formation starts. However, the similarity between the two systems is limited at intermediate (0.1–2 monolayer) coverages. At those coverages we observe a new bonded state for Al on InP, which is not observed on GaAs. Our results emphasize, in general, the need to extend the experiments to ultralow coverages when studying the Schottky barrier formation process.
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