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Schottky barrier formation and the initial metal–atom bonding state: InP(110)–Al vs GaAs(110)–Al

 

作者: Te‐Xiu Zhao,   R. R. Daniels,   A. D. Katnani,   G. Margaritondo,   Alex Zunger,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1983)
卷期: Volume 1, issue 3  

页码: 610-612

 

ISSN:0734-211X

 

年代: 1983

 

DOI:10.1116/1.582608

 

出版商: American Vacuum Society

 

关键词: adsorption;aluminium;photoemission;schottky barrier diodes;synthesis;synchrotron radiation

 

数据来源: AIP

 

摘要:

We investigated the adatom states for different Al coverages of InP(110) by synchrotron‐radiation photoemission, including ultralow coverages below 0.2 monolayer. The adatom states below 0.1 monolayer and above ∼3 monolayer appear similar to the corresponding Al–adatom states on GaAs(110). In particular, the results for both systems appear consistent with the formation of Al clusters at 0.1–2 monolayer coverage, and the Fermi‐level pinning occurs when the cluster formation starts. However, the similarity between the two systems is limited at intermediate (0.1–2 monolayer) coverages. At those coverages we observe a new bonded state for Al on InP, which is not observed on GaAs. Our results emphasize, in general, the need to extend the experiments to ultralow coverages when studying the Schottky barrier formation process.

 

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