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Surface extended x‐ray adsorption fine structure studies of the Si(001) 2×1–Sb interface

 

作者: M. Richter,   J. C. Woicik,   P. Pianetta,   K. E. Miyano,   T. Kendelewicz,   C. E. Bouldin,   W. E. Spicer,   I. Lindau,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  (AIP Available online 1991)
卷期: Volume 9, issue 3  

页码: 1951-1955

 

ISSN:0734-2101

 

年代: 1991

 

DOI:10.1116/1.577433

 

出版商: American Vacuum Society

 

关键词: ANTIMONY;FILMS;SILICON;SURFACES;MICROSTRUCTURE;X−RAY SPECTRA;ABSORPTION SPECTRA;FINE STRUCTURE;AUGER ELECTRON SPECTROSCOPY;SCANNING ELECTRON MICROSCOPY;TUNNEL EFFECT;ANNEALING;ELECTRON DIFFRACTION;Si;Sb

 

数据来源: AIP

 

摘要:

Surface extended x‐ray adsorption fine structure (SEXAFS) has been used to investigate the structure of Sb on the Si(001) 2×1 surface. The coverage of Sb which remains after annealing thick layers at 375 °C, previously reported to be one monolayer (ML), is found in this work to form a disordered overlayer with three dimensional Sb clusters. This finding is concluded from the SbL3absorption spectra which are similar for this coverage to that of bulk Sb. After a 550 °C anneal, Auger electron spectroscopy, and scanning tunneling microscopy (STM) show that about 1 ML of Sb remains. Phase and amplitude analysis of the SbL3edge SEXAFS shows that the remaining Sb atoms occupy a modified bridge site with a Si–Sb bond length of 2.63±0.04 Å. The Sb atoms form dimers with a Sb–Sb bond length of 2.91±0.04 Å, which is almost identical to the bulk Sb–Sb bond length of 2.90 Å. The Sb atoms lie 1.74±0.06 Å above the Si(001) surface. STM confirms the dimer structure of the Sb overlayer.

 

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