Thermally stable amorphous BaxTi2−xOythin films
作者:
W.‐T. Liu,
S. T. Lakshmikumar,
D. B. Knorr,
E. J. Rymaszewski,
T.‐M. Lu,
H. Bakhru,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 7
页码: 809-811
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113428
出版商: AIP
数据来源: AIP
摘要:
The reactive partially ionized beam deposition technique was used to deposit amorphous BaxTi2−xOythin films with the Ba/Ti ratios from 1 for a stoichiometric BaTiO3film to 0.2 for a Ti enriched film. A postdeposition annealing between 500 and 600 °C converted stoichiometric amorphous BaTiO3into polycrystalline structure. This crystallization resulted in densification with a 9% decrease in film thickness. Off‐stoichiometric thin films remained amorphous up to 700 °C. Annealed off‐stoichiometric BaxTi2−xOyfilms, however, had lower leakage current and loss tangent than polycrystalline films due to their amorphous nature making them more suitable for electronic applications. At temperatures of 800 °C or higher, significant reaction occurred between the films and Si substrate as detected by Rutherford backscattered spectroscopy. ©1995 American Institute of Physics.
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