首页   按字顺浏览 期刊浏览 卷期浏览 Erbium doping of molecular‐beam epitaxially grown InSb on InP
Erbium doping of molecular‐beam epitaxially grown InSb on InP

 

作者: J. Heremans,   D. L. Partin,   D. T. Morelli,   C. M. Thrush,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1992)
卷期: Volume 10, issue 2  

页码: 659-663

 

ISSN:1071-1023

 

年代: 1992

 

DOI:10.1116/1.586428

 

出版商: American Vacuum Society

 

关键词: MOLECULAR BEAM EPITAXY;INDIUM ANTIMONIDES;INDIUM PHOSPHIDES;ERBIUM ADDITIONS;THIN FILMS;ELECTRON MOBILITY;ELECTRON DENSITY;MAGNETORESISTANCE;VERY LOW TEMPERATURE;LOW TEMPERATURE;MEDIUM TEMPERATURE;TEMPERATURE DEPENDENCE;InSb:Er

 

数据来源: AIP

 

摘要:

The transport properties of molecular‐beam epitaxially grown InSb films doped with Er (atom densities NErfrom 4.3×1016cm−3to 3.6×1020cm−3) are reported at temperatures between 40 and 400 K. Er is a donor in InSb films grown under Sb to In flux ratios smaller than 1.1. At a flux ratio Sb/In=1.06, 25 atoms of Er give one extrinsic electron. The maximum extrinsic electron concentration achievable is ∼1.8×1017cm−3, obtained for NEr≳4×1018cm−3. Magnetoresistance measurements at 4.2 K show evidence for spin–disorder scattering of the electrons. The low‐temperature (T<150 K) electron mobility increases with doping concentration up to rare‐earth densities of 1×1018cm−3; at higher rare‐earth concentrations, the mobility decreases again. At room temperature, the mobility decreases monotonically with increasing Er concentration. We note the analogy between these results and the observations made on HgSe:Fe, a system in which the carrier mobilities might be enhanced by impurity charge ordering.

 

点击下载:  PDF (466KB)



返 回