Isothermal Plasma Oven
作者:
Lewis Agnew,
C. Summers,
期刊:
Review of Scientific Instruments
(AIP Available online 1966)
卷期:
Volume 37,
issue 9
页码: 1224-1229
ISSN:0034-6748
年代: 1966
DOI:10.1063/1.1720463
出版商: AIP
数据来源: AIP
摘要:
A tantalum oven that produces quiescent isothermal cesium plasmas at precisely known temperatures and pressures is described. The apparatus consists of a closed, cesium vapor filled tube heated by radiation within a resistance heated vacuum furnace. Plasma temperatures up to 2300°K and cesium vapor pressures up to 10 Torr are obtainable. Temperatures are measured by calibrated unsheathed W/W‐26%Re thermocouples. Cesium vapor pressures are known through careful control of the cesium condensation conditions. Designed especially for spectroscopic studies, the oven features two sapphire windows mounted on a line‐of‐sight axis through the plasma. Details of construction and operation are described. Performance data showing temperature profiles to 1% over a 10 cm length are given.
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