Isothermal Plasma Oven

 

作者: Lewis Agnew,   C. Summers,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1966)
卷期: Volume 37, issue 9  

页码: 1224-1229

 

ISSN:0034-6748

 

年代: 1966

 

DOI:10.1063/1.1720463

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A tantalum oven that produces quiescent isothermal cesium plasmas at precisely known temperatures and pressures is described. The apparatus consists of a closed, cesium vapor filled tube heated by radiation within a resistance heated vacuum furnace. Plasma temperatures up to 2300°K and cesium vapor pressures up to 10 Torr are obtainable. Temperatures are measured by calibrated unsheathed W/W‐26%Re thermocouples. Cesium vapor pressures are known through careful control of the cesium condensation conditions. Designed especially for spectroscopic studies, the oven features two sapphire windows mounted on a line‐of‐sight axis through the plasma. Details of construction and operation are described. Performance data showing temperature profiles to 1% over a 10 cm length are given.

 

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